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Limited By: Subject = Atomic layer deposition (ALD);
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Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook (2019)
Ovanesyan, Rafaiel A.; Filatova, Ekaterina A.; Elliott, Simon D.; Hausmann, Dennis M.; ...
University College Cork
Journal article
peer-reviewed
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University College Cork
Journal article
peer-reviewed
Higher Education Authority
Science Foundation Ireland
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University College Cork
Other
peer-reviewed
Science Foundation Ireland
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University College Cork
Journal article
peer-reviewed
Science Foundation Ireland
Higher Education Authority
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University College Cork
Journal article
peer-reviewed
Science Foundation Ireland
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University College Cork
Journal article
peer-reviewed
Science Foundation Ireland
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University College Cork
Journal article
peer-reviewed
Enterprise Ireland
Higher Education Authority
Science Foundation Ireland
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University College Cork
Journal article
peer-reviewed
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Reductive elimination of hypersilyl halides from zinc (II) complexes. Implications for electropositive metal thin film growth (2015)
Sirimanne, Chatu T.; Kerrigan, Marissa M.; Martin, Philip D.; Kanjolia, Ravindra K.; El...
University College Cork
Journal article
peer-reviewed
Science Foundation Ireland
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University College Cork
Journal article
peer-reviewed
Science Foundation Ireland
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