Institutions | About Us | Help | Gaeilge
rian logo


Mark
Go Back
Fully porous GaN p-n junctions fabricated by chemical vapor deposition: a green technology towards more efficient LEDs
Carvajal, Joan J.; Mena, Josue; Bilousov, Oleksandr V.; Martínez, Oscar; Jiménez, Juan J.; Zubialevich, Vitaly Z.; Parbrook, Peter J.; Geaney, Hugh; O'Dwyer, Colm; Diaz, Francesc; Aguilo, Magdalena
Porous GaN based LEDs produced by corrosion etching techniques have demonstrated enhanced light extraction efficiencies in the past. However, these fabrication techniques require further post-growth processing steps, which increase the price of the final device. In this paper, we review the process we developed for the formation of fully porous GaN p-n junctions directly during growth, using a sequential chemical vapor deposition (CVD) process to produce the different layers that form the p-n junction.
Keyword(s): Chemical vapor deposition; Deposition; Energy gap; Gallium nitride; Light emitting diodes; Semiconductor devices; Semiconductor junctions; Semiconductor materials
Publication Date:
2015
Type: Journal article
Peer-Reviewed: Yes
Language(s): English
Institution: University College Cork
Citation(s): Carvajal, J. J., Mena, J., Bilousov, O., Martínez, O., Jiménez, J., Zubialevich, V. Z., Parbrook, P. J., Geaney, H., O'Dwyer, C., Díaz, F. and Aguiló, M. (2015) '(Invited) Fully Porous GaN p-n Junctions Fabricated by Chemical Vapor Deposition: A Green Technology towards More Efficient LEDs', ECS Transactions, 66(1), pp. 163-176. doi: 10.1149/06601.0163ecst
Publisher(s): Electrochemical Society
File Format(s): application/pdf
Related Link(s): http://ecst.ecsdl.org/content/66/1/163.abstract
First Indexed: 2018-08-31 06:30:26 Last Updated: 2019-06-14 06:36:20