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Selective sidewall wetting of polymer blocks in hydrogen silsesquioxane directed self-assembly of PS-b-PDMS
Hobbs, Richard G.; Farrell, Richard A.; Bolger, Ciara T.; Kelly, Róisín A.; Morris, Michael A.; Petkov, Nikolay; Holmes, Justin D.
We show the importance of sidewall chemistry for the graphoepitaxial alignment of PS-b-PDMS using prepatterns fabricated by electron beam lithography of hydrogen silsesquioxane (HSQ) and by deep ultraviolet (DUV) lithography on SiO2 thin films. Density multiplication of polystyrene-block-polydimethylsiloxane (PS-b-PDMS) within both prepatterns was achieved by using a room temperature dynamic solvent annealing environment. Selective tuning of PS and PDMS wetting on the HSQ template sidewalls was also achieved through careful functionalization of the template and substrate surface using either brush or a self-assembled trimethylsilyl monolayer. PDMS selectively wets HSQ sidewalls treated with a brush layer of PDMS, whiereas PS is found to selectively wet HSQ sidewalls treated with hexamethyldisilazane (HMDS) to produce a trimethylsilyl-terminated surface. The etch resistance of the aligned polymer was also evaluated to understand the implications of using block copolymer patterns which have high etch resistance, self-forming (PDMS) wetting layers at both interfaces. The results outlined in this work may have direct applications in nanolithography for continued device scaling toward the end-of-roadmap era.
Keyword(s): Block copolymer; Electron beam lithography; Hydrogen silsesquioxane; Nanolithography; Surface functionalization; Templated self-assembly
Publication Date:
Type: Journal article
Peer-Reviewed: Yes
Language(s): English
Institution: University College Cork
Funder(s): Science Foundation Ireland; Higher Education Authority
Citation(s): Hobbs, R. G., Farrell, R. A., Bolger, C. T., Kelly, R. A., Morris, M. A., Petkov, N. and Holmes, J. D. (2012) 'Selective Sidewall Wetting of Polymer Blocks in Hydrogen Silsesquioxane Directed Self-Assembly of PS-b-PDMS', ACS Applied Materials & Interfaces, 4(9), pp. 4637-4642. doi: 10.1021/am301012p
Publisher(s): American Chemical Society (ACS)
File Format(s): application/pdf
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First Indexed: 2018-09-13 06:30:59 Last Updated: 2018-09-13 06:30:59