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Block copolymer self-assembly based device structures
Rasappa, Sozaraj
This thesis investigated the block copolymer (BCP) thin film characteristics and pattern formation using a set of predetermined molecular weights of PS-b-PMMA and PS-b-PDMS. Post BCP pattern fabrication on the required base substrate a dry plasma etch process was utilised for successful pattern transfer of the BCP resist onto underlying substrate. The resultant sub-10 nm device features were used in front end of line (FEoL) fabrication of active device components in integrated circuits (IC). The potential use of BCP templates were further extended to metal and metal-oxide nanowire fabrication. These nanowires were further investigated in real-time applications as novel sensors and supercapacitors.
Keyword(s): Block copolymer self-assembly; Sensors; Sub-10nm device fabrication; Block copolymers; Plasma etching; Nanowires; Supercapacitors
Publication Date:
2013
Type: Doctoral thesis
Peer-Reviewed: No
Language(s): English
Institution: University College Cork
Funder(s): Science Foundation Ireland
Citation(s): Rasappa, S. 2013. Block copolymer self-assembly based device structures. PhD Thesis, University College Cork.
Publisher(s): University College Cork
File Format(s): application/pdf
Supervisor(s): Morris, Michael A.
First Indexed: 2013-09-26 05:30:28 Last Updated: 2016-10-14 06:17:07