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Influence of elastic strains on the mask ratio in glassy polymer nanoimprint
CROSS, GRAHAM; O'CONNELL, BARRY SEAMUS; PETHICA, JOHN BERNARD
peer-reviewed During glassy polymer nanoimprint, a supported film is extruded from protruding spunchd to recessed scavityd regions of a patterned stamp. The completeness of this extrusion determines the mask ratio for lithographic applications. We show that, for a given punch contact size, there is a residual layer of unextruded material with a mean thickness that is independent of initial film thickness, stamping time, or applied maximum load. Depth sensing indentation enables us to monitor deformation during the imprinting as well as after, and so understand the deformation process involved. It is found that both the geometry and mean thickness of the residual layer are influenced by the overall elastic properties of the stamping system.
Keyword(s): polymer films; nanolithography; soft lithography; masks; indentation; internal stresses; elasticity; plastic deformation
Publication Date:
2005
Type: Journal article
Peer-Reviewed: Yes
Language(s): English
Institution: Trinity College Dublin
Funder(s): Science Foundation Ireland
Citation(s): Graham L. W. Cross, Barry S. O'Connell, and John B. Pethica `Influence of elastic strains on the mask ratio in glassy polymer nanoimprint? in Applied Physics Letters, 86, (8), 2005, 081902
Publisher(s): American Institute of Physics
File Format(s): application/pdf
First Indexed: 2014-05-13 05:44:45 Last Updated: 2017-04-26 08:50:09